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Newly innovated film based Connector
MA Connector
Our commpany have newly developed "high density micro film connector"
by applying A long-term experienced bump-plating technology.
œDec, 2007 Japan Patent (Patent No.4059522j
œFeb, 2009 Korean Patent (Patent No.10-0885121)
œUnder application ; USA, Main part of EU, Asian Countries
@ Inquiry |
áFeatureâ
œ@Short height : lower than 0.3mm
œ@Multi-times repairable
œ@Over 100 times of detachable trust ability
œ@Super high density joint 100-5,000 pins or more
œ@FPC manufacturing process can be applied
áApplicationsâ
œ@Current Connectors ifor Tiny/Thin usej
œ@FPC to FPC iMicro FPC connectionj
œ@FPC to RPC iMicro FPC to Thin RPCj
œ@Cable ifor Coaxial cablej
œ@Socket iSemiconductor, other modulesj
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Connector size
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| Item |
Details |
| Size |
MA-20i20pinsj@4 row~ 5 line@4.5 ~ 5.0mm
MA-40i40pinsj@4 row~ 10 line@4.5 ~ 7.0mm
MA-60i60pinsj@4 row ~ 15 line@4.5 ~ 10.0mm |
| Height |
0.3mm |
| Material |
2 layer FPCE PI 25ƒÊm / Copper 9ƒÊm |
| Height of SUS guide |
0.15mmt |
| Shape of the bump at plugi“Êj side |
150ƒÊ(dia) ~ 200ƒÊ(height) / 0.5mm pitch~ 4 row~ X line |
| Shape of the bump at socketi‰šjside |
PI 25ƒÊ + Copperigold platejcombination : 4 points connected |
| Contact Resistance |
40mĦ`60mĦ |
| Rated Voltage |
Under 0.2A |
| Voltage resistance |
AC150V / 1min. |
| Allowable times of Insert/Extract |
30 times |
| Retention Force |
400`500giPulling FPC verticalityj |
| Hear Resistance |
150Ž ~ 10Hr@OK |
| Operating temperatire range |
-55Ž`90Ž |
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sThe Connection Imaget |
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